Display Settings:

Format
Items per page
Sort by

Send to:

Choose Destination

Results: 1 to 20 of 143

1.

An atomically controlled Si film formation process at low temperatures using atmospheric-pressure VHF plasma.

Yasutake K, Kakiuchi H, Ohmi H, Inagaki K, Oshikane Y, Nakano M.

J Phys Condens Matter. 2011 Oct 5;23(39):394205. doi: 10.1088/0953-8984/23/39/394205. Epub 2011 Sep 15.

PMID:
21921309
[PubMed]
2.

Atomically controlled processing in silicon-based CVD epitaxial growth.

Murota J, Sakuraba M, Tillack B.

J Nanosci Nanotechnol. 2011 Sep;11(9):8348-53.

PMID:
22097582
[PubMed]
3.

Atmospheric-pressure plasma-enhanced chemical vapor deposition of a-SiCN:H films: role of precursors on the film growth and properties.

Guruvenket S, Andrie S, Simon M, Johnson KW, Sailer RA.

ACS Appl Mater Interfaces. 2012 Oct 24;4(10):5293-9. doi: 10.1021/am301157p. Epub 2012 Sep 28.

PMID:
22979919
[PubMed]
4.

Room-temperature formation of low refractive index silicon oxide films using atmospheric-pressure plasma.

Nakamura K, Yamaguchi Y, Yokoyama K, Higashida K, Ohmi H, Kakiuchi H, Yasutake K.

J Nanosci Nanotechnol. 2011 Apr;11(4):2851-5.

PMID:
21776642
[PubMed - indexed for MEDLINE]
5.
6.

Kinetic Monte Carlo simulations of surface growth during plasma deposition of silicon thin films.

Pandey SC, Singh T, Maroudas D.

J Chem Phys. 2009 Jul 21;131(3):034503. doi: 10.1063/1.3152846.

PMID:
19624205
[PubMed - indexed for MEDLINE]
7.

Development of a new laser heating system for thin film growth by chemical vapor deposition.

Fujimoto E, Sumiya M, Ohnishi T, Lippmaa M, Takeguchi M, Koinuma H, Matsumoto Y.

Rev Sci Instrum. 2012 Sep;83(9):094701.

PMID:
23020398
[PubMed]
8.

Mechanisms and energetics of hydride dissociation reactions on surfaces of plasma-deposited silicon thin films.

Singh T, Valipa MS, Mountziaris TJ, Maroudas D.

J Chem Phys. 2007 Nov 21;127(19):194703.

PMID:
18035894
[PubMed]
9.

Thermal-hydrogen promoted selective desorption and enhanced mobility of adsorbed radicals in silicon film growth.

Cereda S, Zipoli F, Bernasconi M, Miglio L, Montalenti F.

Phys Rev Lett. 2008 Feb 1;100(4):046105. Epub 2008 Feb 1.

PMID:
18352308
[PubMed]
10.

Characterization of intrinsic a-Si:H films prepared by inductively coupled plasma chemical vapor deposition for solar cell applications.

Jeong C, Boo S, Jeon M, Kamisako K.

J Nanosci Nanotechnol. 2007 Nov;7(11):4169-73.

PMID:
18047144
[PubMed - indexed for MEDLINE]
11.

Structural evolution of nanocrystalline silicon thin films synthesized in high-density, low-temperature reactive plasmas.

Cheng Q, Xu S, Ostrikov KK.

Nanotechnology. 2009 May 27;20(21):215606. doi: 10.1088/0957-4484/20/21/215606. Epub 2009 May 6.

PMID:
19423937
[PubMed - indexed for MEDLINE]
12.

Cubic SiC nano-thin films and nano-wires: high vacuum metal-organic chemical vapor deposition, surface characterization, and application tests.

Hyun JS, Nam SH, Kang BC, Park JH, Boo JH.

J Nanosci Nanotechnol. 2008 Oct;8(10):5581-5.

PMID:
19198503
[PubMed]
13.

One-step Ge/Si epitaxial growth.

Wu HC, Lin BH, Chen HC, Chen PC, Sheu HS, Lin IN, Chiu HT, Lee CY.

ACS Appl Mater Interfaces. 2011 Jul;3(7):2398-401. doi: 10.1021/am200310c. Epub 2011 Jun 8.

PMID:
21650184
[PubMed]
14.

Ge-rich islands grown on patterned Si substrates by low-energy plasma-enhanced chemical vapour deposition.

Bollani M, Chrastina D, Fedorov A, Sordan R, Picco A, Bonera E.

Nanotechnology. 2010 Nov 26;21(47):475302. doi: 10.1088/0957-4484/21/47/475302. Epub 2010 Oct 29.

PMID:
21030775
[PubMed]
15.

Physical properties of ultrafast deposited micro- and nanothickness amorphous hydrogenated carbon films for medical devices and prostheses.

Zaharia T, Sullivan IL, Saied SO, Bosch RC, Bijker MD.

Proc Inst Mech Eng H. 2007 Feb;221(2):161-72.

PMID:
17385570
[PubMed - indexed for MEDLINE]
16.

Low-plasma and high-temperature PECVD grown silicon-rich SiO(x) film with enhanced carrier tunneling and light emission.

Lin GR, Lin CJ, Lin CT.

Nanotechnology. 2007 Oct 3;18(39):395202. doi: 10.1088/0957-4484/18/39/395202. Epub 2007 Sep 4.

PMID:
21730413
[PubMed]
17.

Interactions between radical growth precursors on plasma-deposited silicon thin-film surfaces.

Bakos T, Valipa MS, Maroudas D.

J Chem Phys. 2007 Mar 21;126(11):114704.

PMID:
17381225
[PubMed]
18.

Synthesis and fundamental studies of (H3Ge)xSiH4-x molecules: precursors to semiconductor hetero- and nanostructures on Si.

Ritter CJ, Hu C, Chizmeshya AV, Tolle J, Klewer D, Tsong IS, Kouvetakis J.

J Am Chem Soc. 2005 Jul 13;127(27):9855-64.

PMID:
15998091
[PubMed]
19.
20.

Controlled nitroxide-mediated styrene surface graft polymerization with atmospheric plasma surface activation.

Lewis GT, Cohen Y.

Langmuir. 2008 Nov 18;24(22):13102-12. doi: 10.1021/la8014173. Epub 2008 Oct 21.

PMID:
18937433
[PubMed]

Display Settings:

Format
Items per page
Sort by

Send to:

Choose Destination

Supplemental Content

Write to the Help Desk