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Results: 1 to 20 of 234

1.

In-situ synchrotron radiation photoemission spectroscopy study of the initial atomic layer deposition of Al2O3 film on Si(001) substrate.

Kim SH, Lee BK, Baik J, Jeon C, Lee SS, Lee J, Hwang HN, Hwang CC, Park CY, An KS.

J Nanosci Nanotechnol. 2011 May;11(5):4328-32.

PMID:
21780451
[PubMed]
2.

Charge-trapping characteristics of Al2O3/Cu/Al2O3 nanolaminate structures prepared through atomic layer deposition.

Lee BK, Kim SH, Park BK, Lee SS, Hwang JH, Chung TM, Lee YK, Kim CG, An KS.

J Nanosci Nanotechnol. 2011 Jul;11(7):5887-91.

PMID:
22121626
[PubMed]
3.

Influence of argon plasma on the deposition of Al2O3 film onto the PET surfaces by atomic layer deposition.

Edy R, Huang X, Guo Y, Zhang J, Shi J.

Nanoscale Res Lett. 2013 Feb 15;8(1):79. doi: 10.1186/1556-276X-8-79.

PMID:
23413804
[PubMed]
Free PMC Article
4.

Quartz crystal microbalance studies of Al2O3 atomic layer deposition using trimethylaluminum and water at 125 degrees C.

Wind RA, George SM.

J Phys Chem A. 2010 Jan 28;114(3):1281-9. doi: 10.1021/jp9049268.

PMID:
19757806
[PubMed - indexed for MEDLINE]
5.

Electronic properties of the interface between p-CuI and anatase-phase n-TiO2 single crystal and nanoparticulate surfaces: a photoemission study.

Kumarasinghe AR, Flavell WR, Thomas AG, Mallick AK, Tsoutsou D, Chatwin C, Rayner S, Kirkham P, Warren S, Patel S, Christian P, O'Brien P, Grätzel M, Hengerer R.

J Chem Phys. 2007 Sep 21;127(11):114703.

PMID:
17887866
[PubMed]
6.

Photoemission study on the valence band of a β-FeSi2 thin film using synchrotron radiation.

Fujimoto H, Ogawa K, Takarabe K, Udono H, Sugiyama H, Azuma J, Takahashi K, Kamada M.

Dalton Trans. 2011 Jun 14;40(22):6023-7. doi: 10.1039/c0dt01832e. Epub 2011 May 9.

PMID:
21552613
[PubMed]
7.

Iron resonant photoemission spectroscopy on anodized hematite points to electron hole doping during anodization.

Braun A, Chen Q, Flak D, Fortunato G, Gajda-Schrantz K, Grätzel M, Graule T, Guo J, Huang TW, Liu Z, Popelo AV, Sivula K, Wadati H, Wyss PP, Zhang L, Zhu J.

Chemphyschem. 2012 Aug 27;13(12):2937-44. doi: 10.1002/cphc.201200074. Epub 2012 Jun 5.

PMID:
22674527
[PubMed]
8.

Design of energy band alignment at the Zn(1-x)Mg(x)O/Cu(In,Ga)Se2 interface for Cd-free Cu(In,Ga)Se2 solar cells.

Lee CS, Larina L, Shin YM, Al-Ammar EA, Ahn BT.

Phys Chem Chem Phys. 2012 Apr 14;14(14):4789-95. doi: 10.1039/c2cp40355b. Epub 2012 Mar 1.

PMID:
22382807
[PubMed]
9.

In-situ synchrotron X-ray scattering study of thin film growth by atomic layer deposition.

Park YJ, Lee DR, Lee HH, Lee HB, Kim H, Park GC, Rhee SW, Baik S.

J Nanosci Nanotechnol. 2011 Feb;11(2):1577-80.

PMID:
21456240
[PubMed]
10.
11.

Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films.

Haeberle J, Henkel K, Gargouri H, Naumann F, Gruska B, Arens M, Tallarida M, Schmeißer D.

Beilstein J Nanotechnol. 2013 Nov 8;4:732-42. doi: 10.3762/bjnano.4.83. eCollection 2013.

PMID:
24367741
[PubMed]
Free PMC Article
12.

Photoemission, resonant photoemission, and x-ray absorption of a Ru(II) complex adsorbed on rutile TiO2(110) prepared by in situ electrospray deposition.

Mayor LC, Ben Taylor J, Magnano G, Rienzo A, Satterley CJ, O'Shea JN, Schnadt J.

J Chem Phys. 2008 Sep 21;129(11):114701. doi: 10.1063/1.2975339.

PMID:
19044974
[PubMed]
13.

Atomic and electronic structure of ultrathin fluoride barrier layers at the oxide/Si interface.

Pasquali L, Montecchi M, Nannarone S, Boscherini F.

J Phys Condens Matter. 2011 Sep 7;23(35):355003. doi: 10.1088/0953-8984/23/35/355003. Epub 2011 Jul 25.

PMID:
21785187
[PubMed]
14.

Characteristics of Al-doped ZnO films grown by atomic layer deposition for silicon nanowire photovoltaic device.

Oh BY, Han JW, Seo DS, Kim KY, Baek SH, Jang HS, Kim JH.

J Nanosci Nanotechnol. 2012 Jul;12(7):5330-5.

PMID:
22966566
[PubMed]
15.

Atom-to-atom interactions for atomic layer deposition of trimethylaluminum on Ga-rich GaAs(001)-4 × 6 and As-rich GaAs(001)-2 × 4 surfaces: a synchrotron radiation photoemission study.

Pi TW, Lin HY, Liu YT, Lin TD, Wertheim GK, Kwo J, Hong M.

Nanoscale Res Lett. 2013 Apr 12;8(1):169. doi: 10.1186/1556-276X-8-169.

PMID:
23587341
[PubMed]
Free PMC Article
16.

Al2O3 and TiO2 atomic layer deposition on copper for water corrosion resistance.

Abdulagatov AI, Yan Y, Cooper JR, Zhang Y, Gibbs ZM, Cavanagh AS, Yang RG, Lee YC, George SM.

ACS Appl Mater Interfaces. 2011 Dec;3(12):4593-601. doi: 10.1021/am2009579. Epub 2011 Nov 16.

PMID:
22032254
[PubMed]
17.

Phase separation in potassium-doped ZnPc thin films.

Giovanelli L, Vilmercati P, Castellarin-Cudia C, Themlin JM, Porte L, Goldoni A.

J Chem Phys. 2007 Jan 28;126(4):044709.

PMID:
17286501
[PubMed]
18.

N doping of TiO2(110): photoemission and density-functional studies.

Nambu A, Graciani J, Rodriguez JA, Wu Q, Fujita E, Sanz JF.

J Chem Phys. 2006 Sep 7;125(9):094706.

PMID:
16965104
[PubMed]
19.

Optical absorption and valence band photoemission from uncapped CdTe nanocrystals.

Tan GL, Wu N, Zheng JG, Hommerich U, Temple D.

J Phys Chem B. 2006 Feb 9;110(5):2125-30.

PMID:
16471793
[PubMed]
20.

Atomic Layer Deposition of a High-k Dielectric on MoS2 Using Trimethylaluminum and Ozone.

Cheng L, Qin X, Lucero AT, Azcatl A, Huang J, Wallace RM, Cho K, Kim J.

ACS Appl Mater Interfaces. 2014 Aug 13;6(15):11834-8. doi: 10.1021/am5032105. Epub 2014 Jul 21.

PMID:
25025335
[PubMed - in process]

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