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Results: 1 to 20 of 129

1.

Impact of AFM-induced nano-pits in a-Si:H films on silicon crystal growth.

Verveniotis E, Rezek B, Sípek E, Stuchlík J, Ledinský M, Kočka J.

Nanoscale Res Lett. 2011 Feb 15;6(1):145. doi: 10.1186/1556-276X-6-145.

PMID:
21711664
[PubMed]
Free PMC Article
2.

Creating nanocrystals in amorphous silicon using a conductive tip.

Rezek B, Sípek E, Ledinský M, Stuchlík J, Vetushka A, Kocka J.

Nanotechnology. 2009 Jan 28;20(4):045302. doi: 10.1088/0957-4484/20/4/045302. Epub 2008 Dec 18.

PMID:
19417314
[PubMed]
3.

[Preparation and characterization of poly-Si films on different topography substrates by AIC].

Wang CL, Fan DW, Liu HZ, Zhang FJ, Xing D, Liu SH.

Guang Pu Xue Yu Guang Pu Fen Xi. 2009 Mar;29(3):752-5. Chinese.

PMID:
19455815
[PubMed]
4.

Structure and 1/f noise of boron doped polymorphous silicon films.

Li SB, Wu ZM, Jiang YD, Li W, Liao NM, Yu JS.

Nanotechnology. 2008 Feb 27;19(8):085706. doi: 10.1088/0957-4484/19/8/085706. Epub 2008 Feb 4.

PMID:
21730737
[PubMed]
5.

Microstructure of femtosecond laser-induced grating in amorphous silicon.

Lee GJ, Park J, Kim E, Lee Y, Kim K, Cheong H, Yoon C, Son YD, Jang J.

Opt Express. 2005 Aug 22;13(17):6445-53.

PMID:
19498658
[PubMed]
6.

Polymorphous silicon thin films obtained by plasma-enhanced chemical vapor deposition using dichlorosilane as silicon precursor.

Remolina A, Monroy BM, García-Sánchez MF, Ponce A, Bizarro M, Alonso JC, Ortiz A, Santana G.

Nanotechnology. 2009 Jun 17;20(24):245604. doi: 10.1088/0957-4484/20/24/245604. Epub 2009 May 27.

PMID:
19471076
[PubMed - indexed for MEDLINE]
7.

Metal-induced crystallization of amorphous Si thin films assisted by atomic layer deposition of nickel oxide layers.

So BS, Bae SM, You YH, Jo D, Lee SS, Chung TM, Kim CG, An KS, Hwang JH.

J Nanosci Nanotechnol. 2011 Aug;11(8):7137-40.

PMID:
22103142
[PubMed]
8.

High pressure growth of nanocrystalline silicon films.

Kumar S, Gope J, Kumar A, Parashar A, Rauthan CM, Dixit PN.

J Nanosci Nanotechnol. 2008 Aug;8(8):4211-7.

PMID:
19049205
[PubMed]
9.

Structural evolution of nanocrystalline silicon thin films synthesized in high-density, low-temperature reactive plasmas.

Cheng Q, Xu S, Ostrikov KK.

Nanotechnology. 2009 May 27;20(21):215606. doi: 10.1088/0957-4484/20/21/215606. Epub 2009 May 6.

PMID:
19423937
[PubMed - indexed for MEDLINE]
10.

Nanocomposite metal amorphous-carbon thin films deposited by hybrid PVD and PECVD technique.

Teixeira V, Soares P, Martins AJ, Carneiro J, Cerqueira F.

J Nanosci Nanotechnol. 2009 Jul;9(7):4061-6.

PMID:
19916409
[PubMed]
11.
12.

Immobilisation and synthesis of DNA on Si(111), nanocrystalline porous silicon and silicon nanoparticles.

Lie LH, Patole SN, Pike AR, Ryder LC, Connolly BA, Ward AD, Tuite EM, Houlton A, Horrocks BR.

Faraday Discuss. 2004;125:235-49; discussion 293-309.

PMID:
14750674
[PubMed - indexed for MEDLINE]
13.

Solution-based synthesis of crystalline silicon from liquid silane through laser and chemical annealing.

Iyer GR, Hobbie EK, Guruvenket S, Hoey JM, Anderson KJ, Lovaasen J, Gette C, Schulz DL, Swenson OF, Elangovan A, Boudjouk P.

ACS Appl Mater Interfaces. 2012 May;4(5):2680-5. doi: 10.1021/am300334p. Epub 2012 May 8.

PMID:
22545711
[PubMed]
14.

The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition.

Cervenka J, Ledinský M, Stuchlík J, Stuchlíková H, Bakardjieva S, Hruska K, Fejfar A, Kocka J.

Nanotechnology. 2010 Oct 15;21(41):415604. doi: 10.1088/0957-4484/21/41/415604. Epub 2010 Sep 16.

PMID:
20844323
[PubMed]
15.

Atmospheric-pressure plasma-enhanced chemical vapor deposition of a-SiCN:H films: role of precursors on the film growth and properties.

Guruvenket S, Andrie S, Simon M, Johnson KW, Sailer RA.

ACS Appl Mater Interfaces. 2012 Oct 24;4(10):5293-9. doi: 10.1021/am301157p. Epub 2012 Sep 28.

PMID:
22979919
[PubMed]
16.

Preparation of phosphorus doped hydrogenated microcrystalline silicon thin films by inductively coupled plasma chemical vapor deposition and their characteristics for solar cell applications.

Jeong C, Boo S, Kim TW, Choi BH, Kim HS, Chang DR, Lee JH, Kamisako K.

J Nanosci Nanotechnol. 2008 Oct;8(10):5521-6.

PMID:
19198490
[PubMed]
17.

Effect on thickness of Al layer in poly-crystalline Si thin films using aluminum(Al) induced crystallization method.

Jeong C, Na HS, Lee SH.

J Nanosci Nanotechnol. 2011 Feb;11(2):1350-3.

PMID:
21456186
[PubMed]
18.

Cubic SiC nano-thin films and nano-wires: high vacuum metal-organic chemical vapor deposition, surface characterization, and application tests.

Hyun JS, Nam SH, Kang BC, Park JH, Boo JH.

J Nanosci Nanotechnol. 2008 Oct;8(10):5581-5.

PMID:
19198503
[PubMed]
19.

Photoluminescence from intermediate phase silicon structure and nanocrystalline silicon in plasma enhanced chemical vapor deposition grown Si/SiO(2) multilayers.

Han PG, Ma ZY, Wang ZB, Zhang X.

Nanotechnology. 2008 Aug 13;19(32):325708. doi: 10.1088/0957-4484/19/32/325708. Epub 2008 Jul 4.

PMID:
21828830
[PubMed]
20.

Silicide-induced multi-wall carbon nanotube growth on silicon nanowires.

Lee JH, Lund IN, Eisenbraun ET, Geer RE.

Nanotechnology. 2011 Feb 25;22(8):085603. doi: 10.1088/0957-4484/22/8/085603. Epub 2011 Jan 17.

PMID:
21242615
[PubMed]

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