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Results: 1 to 20 of 149

1.

Influence of CH(4) partial pressure on the microstructure of sputter-deposited tungsten carbide thin films.

Abdelouahdi K, Sant C, Miserque F, Aubert P, Zheng Y, Legrand-Buscema C, Perrière J.

J Phys Condens Matter. 2006 Feb 15;18(6):1913-25. doi: 10.1088/0953-8984/18/6/008. Epub 2006 Jan 24.

PMID:
21697565
[PubMed]
2.

Nanocomposite metal amorphous-carbon thin films deposited by hybrid PVD and PECVD technique.

Teixeira V, Soares P, Martins AJ, Carneiro J, Cerqueira F.

J Nanosci Nanotechnol. 2009 Jul;9(7):4061-6.

PMID:
19916409
[PubMed]
3.

Processing, structure, and properties of nanostructured multifunctional tribological coatings.

Lin J, Park IW, Mishra B, Pinkas M, Moore JJ, Anton JM, Kim KH, Voevodin AA, Levashov EA.

J Nanosci Nanotechnol. 2009 Jul;9(7):4073-84.

PMID:
19916411
[PubMed]
4.

Sputter deposition of nanocrystalline beta-SiC films and molecular dynamics simulations of the sputter process.

Ziebert C, Ye J, Ulrich S, Prskalo AP, Schmauder S.

J Nanosci Nanotechnol. 2010 Feb;10(2):1120-8.

PMID:
20352766
[PubMed]
5.

Effects of the chemical bonding on the optical and mechanical properties for germanium carbide films used as antireflection and protection coating of ZnS windows.

Hu C, Zheng W, Tian H, Xu L, Jiang Q.

J Phys Condens Matter. 2006 May 3;18(17):4231-41. doi: 10.1088/0953-8984/18/17/011. Epub 2006 Apr 13.

PMID:
21690777
[PubMed]
6.

Effect of postdeposition annealing on the structure, composition, and the mechanical and optical characteristics of niobium and tantalum oxide films.

Cetinörgü-Goldenberg E, Klemberg-Sapieha JE, Martinu L.

Appl Opt. 2012 Sep 20;51(27):6498-507. doi: 10.1364/AO.51.006498.

PMID:
23033019
[PubMed]
7.

Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering.

Cetinörgü E, Baloukas B, Zabeida O, Klemberg-Sapieha JE, Martinu L.

Appl Opt. 2009 Aug 10;48(23):4536-44.

PMID:
19668268
[PubMed]
8.

On the thermal annealing conditions for self-synthesis of tungsten carbide nanowires from WC(x) films.

Wang SJ, Chen CH, Chang SC, Wong CH, Uang KM, Chen TM, Ko RM, Liou BW.

Nanotechnology. 2005 Feb;16(2):273-7. doi: 10.1088/0957-4484/16/2/016. Epub 2005 Jan 13.

PMID:
21727435
[PubMed]
9.

Influence of the N2 partial pressure on the characteristics of CrZrN coatings synthesized Using a segment CrZr target.

Kim Y, Kim G, Lee S.

J Nanosci Nanotechnol. 2011 Oct;11(10):8792-7.

PMID:
22400261
[PubMed]
10.

Correlation between surface chemistry, density, and band gap in nanocrystalline WO3 thin films.

Vemuri RS, Engelhard MH, Ramana CV.

ACS Appl Mater Interfaces. 2012 Mar;4(3):1371-7. doi: 10.1021/am2016409. Epub 2012 Feb 14.

PMID:
22332637
[PubMed]
11.

Electrochromic properties of tungsten-titanium oxide films.

Chen YC, Lin TN, Chen TL, Li YD, Weng KW.

J Nanosci Nanotechnol. 2012 Feb;12(2):1296-300.

PMID:
22629942
[PubMed]
12.

The Structure of W/C (0.15 < γ < 0.8) Multilayers Annealed in Argon or Air.

Gonzalez-Hernandez J, Chao BS, Ovshinsky SR, Allred DD.

J Xray Sci Technol. 1996 Jan 1;6(1):1-31. doi: 10.3233/XST-1996-6101.

PMID:
21307510
[PubMed]
13.

Electrochromic behavior of W(x)Si(y)O(z) thin films prepared by reactive magnetron sputtering at normal and glancing angles.

Gil-Rostra J, Cano M, Pedrosa JM, Ferrer FJ, García-García F, Yubero F, González-Elipe AR.

ACS Appl Mater Interfaces. 2012 Feb;4(2):628-38. doi: 10.1021/am2014629. Epub 2012 Jan 24.

PMID:
22208156
[PubMed]
14.

Physical and chemical properties of sputter-deposited TaC(x)N(y) films.

Aouadi SM, Zhang Y, Basnyat P, Stadler S, Filip P, Williams M, Hilfiker JN, Singh N, Woollam JA.

J Phys Condens Matter. 2006 Feb 15;18(6):1977-86. doi: 10.1088/0953-8984/18/6/013. Epub 2006 Jan 25.

PMID:
21697570
[PubMed]
15.

Structure analysis of sputter-coated and ion-beam sputter-coated films: a comparative study.

Kemmenoe BH, Bullock GR.

J Microsc. 1983 Nov;132(Pt 2):153-63.

PMID:
6358510
[PubMed - indexed for MEDLINE]
16.

A complete characterization of Ca5(PO4)3OH sputter-deposited films by ion beam analysis: RBS and ERD.

van Dijk K, Marée CH, Verhoeven J, Habraken FH, Jansen JA.

J Biomed Mater Res. 1998 Nov;42(2):266-71.

PMID:
9773822
[PubMed - indexed for MEDLINE]
17.

Homogeneous nanocrystalline cubic silicon carbide films prepared by inductively coupled plasma chemical vapor deposition.

Cheng Q, Xu S, Long J, Huang S, Guo J.

Nanotechnology. 2007 Nov 21;18(46):465601. doi: 10.1088/0957-4484/18/46/465601. Epub 2007 Oct 12.

PMID:
21730481
[PubMed]
18.

Comparative study of nanocrystalline diamond deposition on WC-Ni and WC-Co substrates.

Santos JA, Neto VF, Cabral G, Ruch D, Grácio J.

J Nanosci Nanotechnol. 2011 Jun;11(6):5388-93.

PMID:
21770193
[PubMed]
19.

Synthesis and characterization of nanocrystalline Ti(1-x)Al(x)N by reactive magnetron sputtering.

Jose F, Ramaseshan R, Dash S, Dasgupta A, Saroja S, Tyagi AK.

J Nanosci Nanotechnol. 2009 Sep;9(9):5451-4.

PMID:
19928242
[PubMed - in process]
20.

Ti-Si-C thin films produced by magnetron sputtering: correlation between physical properties, mechanical properties and tribological behavior.

Cunha L, Vaz F, Moura C, Munteanu D, Ionescu C, Rivière JP, Le Bourhis E.

J Nanosci Nanotechnol. 2010 Apr;10(4):2926-32.

PMID:
20355526
[PubMed - indexed for MEDLINE]

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