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Results: 1 to 20 of 95

1.

From light scattering to the microstructure of thin-film multilayers.

Amra C.

Appl Opt. 1993 Oct 1;32(28):5481-91. doi: 10.1364/AO.32.005481.

PMID:
20856359
[PubMed]
2.

Multiscale roughness in optical multilayers: atomic force microscopy and light scattering.

Deumié C, Richier R, Dumas P, Amra C.

Appl Opt. 1996 Oct 1;35(28):5583-94. doi: 10.1364/AO.35.005583.

PMID:
21127561
[PubMed]
3.

Characterization of thin film surfaces over an extended spatial wavelength range.

Lu Z, Tang JF.

Appl Opt. 1989 Jul 15;28(14):2765-8. doi: 10.1364/AO.28.002765.

PMID:
20555596
[PubMed]
4.

Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers.

Trost M, Schröder S, Feigl T, Duparré A, Tünnermann A.

Appl Opt. 2011 Mar 20;50(9):C148-53. doi: 10.1364/AO.50.00C148.

PMID:
21460930
[PubMed]
5.

Role of interface correlation in light scattering by a multilayer.

Amra C, Apfel JH, Pelletier E.

Appl Opt. 1992 Jun 1;31(16):3134-51. doi: 10.1364/AO.31.003134.

PMID:
20725259
[PubMed]
6.

Low-level scattering and localized defects.

Maure S, Albrand G, Amra C.

Appl Opt. 1996 Oct 1;35(28):5573-82. doi: 10.1364/AO.35.005573.

PMID:
21127560
[PubMed]
7.

Ion-assisted deposition of oxide materials at room temperature by use of different ion sources.

Niederwald H, Laux S, Kennedy M, Schallenberg U, Duparré A, Mertin M, Kaiser N, Ristau D.

Appl Opt. 1999 Jun 1;38(16):3610-3.

PMID:
18319964
[PubMed]
8.

Roughness evolution and scatter losses of multilayers for 193 nm optics.

Schröder S, Duparré A, Tünnermann A.

Appl Opt. 2008 May 1;47(13):C88-97.

PMID:
18449277
[PubMed]
9.

Electron microscopic investigations of cross sections of optical thin films.

Guenther KH, Pulker HK.

Appl Opt. 1976 Dec 1;15(12):2992-7. doi: 10.1364/AO.15.002992.

PMID:
20168380
[PubMed]
10.

Light-scattering measurements of optical thin-film components at 157 and 193 nm.

Gliech S, Steinert J, Duparré A.

Appl Opt. 2002 Jun 1;41(16):3224-35.

PMID:
12064406
[PubMed]
11.

Temperature stability of thin-film narrow-bandpass filters produced by ion-assisted deposition.

Takashashi H.

Appl Opt. 1995 Feb 1;34(4):667-75. doi: 10.1364/AO.34.000667.

PMID:
20963167
[PubMed]
12.

Temperature-stable bandpass filters deposited with plasma ion-assisted deposition.

Zöller A, Götzelmann R, Matl K, Cushing D.

Appl Opt. 1996 Oct 1;35(28):5609-12. doi: 10.1364/AO.35.005609.

PMID:
21127564
[PubMed]
13.

Relation between light scattering and the microstructure of optical thin films.

Duparré A, Kassam S.

Appl Opt. 1993 Oct 1;32(28):5475-80. doi: 10.1364/AO.32.005475.

PMID:
20856358
[PubMed]
14.

Characterization of thin polymer films by X-ray reflectometry with synchrotron radiation.

Kago K, Endo H, Matsuoka H, Yamaoka H, Hamaya N, Tanaka M, Mori T.

J Synchrotron Radiat. 1998 Sep 1;5(Pt 5):1304-8.

PMID:
16687838
[PubMed]
15.

Angle-resolved scattering: an effective method for characterizing thin-film coatings.

Schröder S, Herffurth T, Blaschke H, Duparré A.

Appl Opt. 2011 Mar 20;50(9):C164-71. doi: 10.1364/AO.50.00C164.

PMID:
21460933
[PubMed]
16.

Optical waveguide characterization of dielectric films deposited by reactive low-voltage ion plating.

Kimble TC, Himel MD, Guenther KH.

Appl Opt. 1993 Oct 1;32(28):5640-4. doi: 10.1364/AO.32.005640.

PMID:
20856380
[PubMed]
17.

Comparative study of titanium dioxide thin films produced by electron-beam evaporation and by reactive low-voltage ion plating.

Balasubramanian K, Han XF, Guenther KH.

Appl Opt. 1993 Oct 1;32(28):5594-600. doi: 10.1364/AO.32.005594.

PMID:
20856374
[PubMed]
18.

Dispersion-model-free determination of optical constants: application to materials for organic thin film devices.

Flämmich M, Danz N, Michaelis D, Bräuer A, Gather MC, Kremer JH, Meerholz K.

Appl Opt. 2009 Mar 10;48(8):1507-13.

PMID:
19277083
[PubMed]
19.

Elimination of polarized light scattered by surface roughness or bulk heterogeneity.

Amra C, Deumie C, Gilbert O.

Opt Express. 2005 Dec 26;13(26):10854-64.

PMID:
19503304
[PubMed]
20.

EUV reflectance and scattering of Mo/Si multilayers on differently polished substrates.

Schröder S, Feigl T, Duparré A, Tünnermann A.

Opt Express. 2007 Oct 17;15(21):13997-4012.

PMID:
19550673
[PubMed]

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