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Items: 1 to 20 of 96

1.

Antireflection surfaces in silicon using binary optics technology.

Motamedi ME, Southwell WH, Gunning WJ.

Appl Opt. 1992 Aug 1;31(22):4371-6. doi: 10.1364/AO.31.004371.

PMID:
20725430
2.

Fabrication and configuration development of silicon nitride sub-wavelength structures for solar cell application.

Sahoo KC, Chang EY, Li Y, Lin MK, Huang JH.

J Nanosci Nanotechnol. 2010 Sep;10(9):5692-9.

PMID:
21133093
4.

Laser-generated broadband antireflection structures for freeform silicon lenses at terahertz frequencies.

Brahm A, Döring S, Wilms A, Notni G, Nolte S, Tünnermann A.

Appl Opt. 2014 May 1;53(13):2886-91. doi: 10.1364/AO.53.002886.

PMID:
24921876
5.

High-spatial-frequency binary and multilevel stairstep gratings: polarization-selective mirrors and broadband antireflection surfaces.

Glytsis EN, Gaylord TK.

Appl Opt. 1992 Aug 1;31(22):4459-70. doi: 10.1364/AO.31.004459.

PMID:
20725442
6.

A photoacoustic imager with light illumination through an infrared-transparent silicon CMUT array.

Chen J, Wang M, Cheng JC, Wang YH, Li PC, Cheng X.

IEEE Trans Ultrason Ferroelectr Freq Control. 2012 Apr;59(4):766-75. doi: 10.1109/TUFFC.2012.2254.

PMID:
22547287
7.

Experimental study of porous silicon shell pillars under retentive conditions.

De Malsche W, Gardeniers H, Desmet G.

Anal Chem. 2008 Jul 15;80(14):5391-400. doi: 10.1021/ac800424q. Epub 2008 Jun 18.

PMID:
18558724
8.

Homogeneous layer models for high-spatial-frequency dielectric surface-relief gratings: conical diffraction and antireflection designs.

Brundrett DL, Glytsis EN, Gaylord TK.

Appl Opt. 1994 May 1;33(13):2695-706. doi: 10.1364/AO.33.002695.

PMID:
20885626
9.

Controlled thinning and surface smoothening of silicon nanopillars.

Kalem S, Werner P, Nilsson B, Talalaev VG, Hagberg M, Arthursson O, Södervall U.

Nanotechnology. 2009 Nov 4;20(44):445303. doi: 10.1088/0957-4484/20/44/445303. Epub 2009 Oct 5.

PMID:
19801781
10.

Fabrication, surface properties, and origin of superoleophobicity for a model textured surface.

Zhao H, Law KY, Sambhy V.

Langmuir. 2011 May 17;27(10):5927-35. doi: 10.1021/la104872q. Epub 2011 Apr 12.

PMID:
21486088
11.

Light trapping by backside diffraction gratings in silicon solar cells revisited.

Wellenzohn M, Hainberger R.

Opt Express. 2012 Jan 2;20(1):A20-7.

PMID:
22379675
12.

Attachment of astroglial cells to microfabricated pillar arrays of different geometries.

Turner AM, Dowell N, Turner SW, Kam L, Isaacson M, Turner JN, Craighead HG, Shain W.

J Biomed Mater Res. 2000 Sep 5;51(3):430-41.

PMID:
10880086
13.

Impact of the limitations of state-of-the-art micro-fabrication processes on the performance of pillar array columns for liquid chromatography.

Op de Beeck J, De Malsche W, Tezcan DS, De Moor P, Desmet G.

J Chromatogr A. 2012 May 25;1239:35-48. doi: 10.1016/j.chroma.2012.03.054. Epub 2012 Mar 22.

PMID:
22513131
14.

Porous SiO₂/MgF₂ broadband antireflection coatings for superstrate-type silicon-based tandem cells.

Wang NF, Kuo TW, Tsai YZ, Lin SX, Hung PK, Lin CL, Houng MP.

Opt Express. 2012 Mar 26;20(7):7445-53. doi: 10.1364/OE.20.007445.

PMID:
22453424
15.

Polarization-selective computer-generated holograms: design, fabrication, and applications.

Xu F, Ford JE, Fainman Y.

Appl Opt. 1995 Jan 10;34(2):256-66. doi: 10.1364/AO.34.000256.

PMID:
20963110
16.

Superhydrophobic silicon surfaces with micro-nano hierarchical structures via deep reactive ion etching and galvanic etching.

He Y, Jiang C, Yin H, Chen J, Yuan W.

J Colloid Interface Sci. 2011 Dec 1;364(1):219-29. doi: 10.1016/j.jcis.2011.07.030. Epub 2011 Aug 5.

PMID:
21889158
17.
18.

Comparison of antireflection surfaces based on two-dimensional binary gratings and thin-film coatings.

Shokooh-Saremi M, Mirsalehi MM.

Appl Opt. 2005 Jul 1;44(19):3877-84.

PMID:
16004031
19.

Combined micro- and nano-scale surface textures for enhanced near-infrared light harvesting in silicon photovoltaics.

Chang CH, Yu P, Hsu MH, Tseng PC, Chang WL, Sun WC, Hsu WC, Hsu SH, Chang YC.

Nanotechnology. 2011 Mar 4;22(9):095201. doi: 10.1088/0957-4484/22/9/095201. Epub 2011 Jan 24.

PMID:
21258142
20.

Increasing active surface area to fabricate ultra-hydrophobic surface by using "Black silicon" with bosch etching process.

Atthi N, Supadech J, Dupuy G, Nimittrakoolchai OU, Pankiew A, Supothina S, Jeamsaksiri W, Hruanun C, Poyai A, Brachais CH.

J Nanosci Nanotechnol. 2012 Jun;12(6):4919-27.

PMID:
22905552
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