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Items: 1 to 20 of 106

1.

The fabrication of embedded co-planar electrodes using a self-assembled monolayer molecular resist.

Johnson S, Evans D, Davies AG, Linfield EH, Wälti C.

Nanotechnology. 2009 Apr 15;20(15):155304. doi: 10.1088/0957-4484/20/15/155304. Epub 2009 Mar 24.

PMID:
19420546
2.

Flip-chip fabrication of nanoscale co-planar embedded electrodes with controlled exposed areas.

Kiyat I, Davies AG, Linfield EH, Wälti C.

Nanotechnology. 2010 Nov 12;21(45):455301. doi: 10.1088/0957-4484/21/45/455301. Epub 2010 Oct 14.

PMID:
20947942
3.

Stamped microbattery electrodes based on self-assembled M13 viruses.

Nam KT, Wartena R, Yoo PJ, Liau FW, Lee YJ, Chiang YM, Hammond PT, Belcher AM.

Proc Natl Acad Sci U S A. 2008 Nov 11;105(45):17227-31. doi: 10.1073/pnas.0711620105. Epub 2008 Aug 27.

4.

Patterned organosilane monolayers as lyophobic-lyophilic guiding templates in surface self-assembly: monolayer self-assembly versus wetting-driven self-assembly.

Zeira A, Chowdhury D, Hoeppener S, Liu S, Berson J, Cohen SR, Maoz R, Sagiv J.

Langmuir. 2009 Dec 15;25(24):13984-4001. doi: 10.1021/la902107u.

PMID:
19835384
5.

Strategies for the fabrication of porous platinum electrodes.

Kloke A, von Stetten F, Zengerle R, Kerzenmacher S.

Adv Mater. 2011 Nov 16;23(43):4976-5008. Review.

PMID:
22180890
6.

Ultra-flat coplanar electrodes for controlled electrical contact of molecular films.

Martin F, Hendriksen B, Katan A, Ratera I, Qi Y, Harteneck B, Liddle JA, Salmeron M.

Rev Sci Instrum. 2011 Dec;82(12):123901. doi: 10.1063/1.3664789.

PMID:
22225225
7.

ALD resist formed by vapor-deposited self-assembled monolayers.

Hong J, Porter DW, Sreenivasan R, McIntyre PC, Bent SF.

Langmuir. 2007 Jan 30;23(3):1160-5.

PMID:
17241027
8.

Microcontact-printed self-assembled monolayers as ultrathin gate dielectrics in organic thin-film transistors and complementary circuits.

Zschieschang U, Halik M, Klauk H.

Langmuir. 2008 Mar 4;24(5):1665-9. doi: 10.1021/la703818d. Epub 2008 Jan 17.

PMID:
18198917
9.

On the chemical modification of pacemaker electrodes and patterned surface functionalization of planar substrates.

Stelzle M, Wagner R, Nisch W, Jägermann W, Fröhlich R, Schaldach M.

Biosens Bioelectron. 1997;12(8):853-65.

PMID:
9421891
10.

Engineering silicon oxide surfaces using self-assembled monolayers.

Onclin S, Ravoo BJ, Reinhoudt DN.

Angew Chem Int Ed Engl. 2005 Oct 7;44(39):6282-304.

PMID:
16172993
11.

Rapid assembly of photosystem I monolayers on gold electrodes.

Faulkner CJ, Lees S, Ciesielski PN, Cliffel DE, Jennings GK.

Langmuir. 2008 Aug 19;24(16):8409-12. doi: 10.1021/la800670b. Epub 2008 Jul 18.

PMID:
18636757
12.

Towards molecular electronics with large-area molecular junctions.

Akkerman HB, Blom PW, de Leeuw DM, de Boer B.

Nature. 2006 May 4;441(7089):69-72.

PMID:
16672966
13.

Organosilane self-assembled monolayer growth from supercritical carbon dioxide in microstructured optical fiber capillary arrays.

Danisman MF, Calkins JA, Sazio PJ, Allara DL, Badding JV.

Langmuir. 2008 Apr 1;24(7):3636-44. doi: 10.1021/la703155z. Epub 2008 Feb 27.

PMID:
18302428
14.
15.

Continuous modulation of electrode work function with mixed self-assembled monolayers and its effect in charge injection.

Wu KY, Yu SY, Tao YT.

Langmuir. 2009 Jun 2;25(11):6232-8. doi: 10.1021/la900046b.

PMID:
19466782
16.
17.

Fabrication of transparent capacitive structure by self-assembled thin films.

Zhang Q, Shin YJ, Hua F, Saraf LV, Matson DW.

J Nanosci Nanotechnol. 2008 Jun;8(6):3008-12.

PMID:
18681039
18.

One-step substrate nanofabrication and patterning of nanoparticles by lithographically controlled etching.

Bianchi M, Herrero DL, Valle F, Greco P, Ingo GM, Kaciulis S, Biscarini F, Cavallini M.

Nanotechnology. 2011 Sep 2;22(35):355301. doi: 10.1088/0957-4484/22/35/355301. Epub 2011 Aug 5.

PMID:
21817780
19.

Using azobenzene-embedded self-assembled monolayers to photochemically control cell adhesion reversibly.

Liu D, Xie Y, Shao H, Jiang X.

Angew Chem Int Ed Engl. 2009;48(24):4406-8. doi: 10.1002/anie.200901130.

PMID:
19431170
20.

Monolayer resist for patterned contact printing of aligned nanowire arrays.

Takahashi T, Takei K, Ho JC, Chueh YL, Fan Z, Javey A.

J Am Chem Soc. 2009 Feb 18;131(6):2102-3. doi: 10.1021/ja8099954.

PMID:
19173560
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