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Results: 1 to 20 of 376

1.

Very low-refractive-index optical thin films consisting of an array of SiO2 nanorods.

Xi JQ, Kim JK, Schubert EE, Ye D, Lu TM, Lin SY, Juneja JS.

Opt Lett. 2006 Mar 1;31(5):601-3.

PMID:
16570411
[PubMed]
2.

Silica nanorod-array films with very low refractive indices.

Xi JQ, Kim JK, Schubert EF.

Nano Lett. 2005 Jul;5(7):1385-7.

PMID:
16178243
[PubMed - indexed for MEDLINE]
3.

Omnidirectional reflector using nanoporous SiO2 as a low-refractive-index material.

Xi JQ, Ojha M, Cho W, Plawsky JL, Gill WN, Gessmann T, Schubert EF.

Opt Lett. 2005 Jun 15;30(12):1518-20.

PMID:
16007793
[PubMed]
4.

Ultralow-dielectric-constant optical thin films built from magnesium oxyfluoride vesicle-like hollow nanoparticles.

Grosso D, Boissière C, Sanchez C.

Nat Mater. 2007 Aug;6(8):572-5. Epub 2007 Jun 24.

PMID:
17589514
[PubMed]
5.

The electro-optical behavior of liquid crystal molecules on the surface of SiO2 inorganic thin films.

Sung SJ, Yang KJ, Kim DH, Do YS, Kang JK, Choi BD.

J Nanosci Nanotechnol. 2009 Dec;9(12):6938-42.

PMID:
19908702
[PubMed]
6.

The properties of TiO2 nanoceramic films prepared by electron beam evaporation.

Lin SS, Hung YH, Chen SC.

J Nanosci Nanotechnol. 2009 Jun;9(6):3599-605.

PMID:
19504888
[PubMed]
7.

Refractive index of thin films of SiO2, ZrO2, and HfO2 as a function of the films' mass density.

Jerman M, Qiao Z, Mergel D.

Appl Opt. 2005 May 20;44(15):3006-12.

PMID:
15929291
[PubMed]
8.

Control of thermal deformation in dielectric mirrors using mechanical design and atomic layer deposition.

Gabriel NT, Kim SS, Talghader JJ.

Opt Lett. 2009 Jul 1;34(13):1958-60.

PMID:
19571965
[PubMed]
9.

Ultralow-refractive-index optical thin films through nanoscale etching of ordered mesoporous silica films.

Chi F, Yan L, Yan H, Jiang B, Lv H, Yuan X.

Opt Lett. 2012 May 1;37(9):1406-8. doi: 10.1364/OL.37.001406.

PMID:
22555686
[PubMed]
10.

Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering.

Lee CC, Tien CL, Hsu JC.

Appl Opt. 2002 Apr 1;41(10):2043-7.

PMID:
11936809
[PubMed]
11.

Encapsulation of low-refractive-index SiO(2) nanorods by Al(2)O(3) with atomic layer deposition.

Kim SS, Gabriel NT, Song WB, Talghader JJ.

Opt Express. 2007 Nov 26;15(24):16285-91.

PMID:
19550917
[PubMed]
12.

Wide angular range operation of a dielectric multilayer film with a photonic-crystal-type defect.

Deparis O, Vandenbem C, Vigneron JP.

Opt Lett. 2007 Mar 15;32(6):686-8.

PMID:
17308602
[PubMed]
13.

Preparation of MgF2-SiO2 thin films with a low refractive index by a solgel process.

Ishizawa H, Niisaka S, Murata T, Tanaka A.

Appl Opt. 2008 May 1;47(13):C200-5.

PMID:
18449247
[PubMed]
15.

Three-dimensional optical metamaterial with a negative refractive index.

Valentine J, Zhang S, Zentgraf T, Ulin-Avila E, Genov DA, Bartal G, Zhang X.

Nature. 2008 Sep 18;455(7211):376-9. doi: 10.1038/nature07247. Epub 2008 Aug 11.

PMID:
18690249
[PubMed]
16.

a-Si:H/SiO2 multilayer films fabricated by radio-frequency magnetron sputtering for optical filters.

Yoda H, Shiraishi K, Hiratani Y, Hanaizumi O.

Appl Opt. 2004 Jun 10;43(17):3548-54.

PMID:
15219039
[PubMed]
17.
19.

Soft-mode hardening in SrTiO3 thin films

Sirenko AA, Bernhard C, Golnik A, Clark AM, Hao J, Si W, Xi XX.

Nature. 2000 Mar 23;404(6776):373-6.

PMID:
10746720
[PubMed - as supplied by publisher]
20.

High optical absorption of indium sulfide nanorod arrays formed by glancing angle deposition.

Cansizoglu MF, Engelken R, Seo HW, Karabacak T.

ACS Nano. 2010 Feb 23;4(2):733-40. doi: 10.1021/nn901180x.

PMID:
20131854
[PubMed]

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