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Items: 1 to 20 of 224

1.

Refractive index and extinction coefficient dependence of thin Al and Ir films on deposition technique and thickness.

Lehmuskero A, Kuittinen M, Vahimaa P.

Opt Express. 2007 Aug 20;15(17):10744-52.

PMID:
19547430
2.

The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition.

Wang ZY, Zhang RJ, Lu HL, Chen X, Sun Y, Zhang Y, Wei YF, Xu JP, Wang SY, Zheng YX, Chen LY.

Nanoscale Res Lett. 2015 Feb 6;10:46. doi: 10.1186/s11671-015-0757-y. eCollection 2015.

3.
4.

Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering.

Lee CC, Tien CL, Hsu JC.

Appl Opt. 2002 Apr 1;41(10):2043-7.

PMID:
11936809
6.

Ion assisted deposition of thermally evaporated Ag and Al films.

Hwangbo CK, Lingg LJ, Lehan JP, Macleod HA, Makous JL, Kim SY.

Appl Opt. 1989 Jul 15;28(14):2769-78. doi: 10.1364/AO.28.002769.

PMID:
20555597
7.
8.

Optical studies of pulsed laser deposited nanostructured Pb(Zr0.52Ti0.48)O3 thin film by spectroscopic ellipsometry.

Prabu M, Banu IB, Sundari ST, Krishnan R, Chen YC, Chavali M.

J Nanosci Nanotechnol. 2014 Jul;14(7):5335-41.

PMID:
24758028
9.
10.

Optical properties of Al2O3 thin films grown by atomic layer deposition.

Kumar P, Wiedmann MK, Winter CH, Avrutsky I.

Appl Opt. 2009 Oct 1;48(28):5407-12. doi: 10.1364/AO.48.005407.

PMID:
19798382
11.

Microstructure-related properties of magnesium fluoride films at 193nm by oblique-angle deposition.

Guo C, Kong M, Lin D, Liu C, Li B.

Opt Express. 2013 Jan 14;21(1):960-7. doi: 10.1364/OE.21.000960.

PMID:
23388989
13.

Measurement of the refractive index and thickness for infrared optical films deposited on rough substrates.

Saito M, Nakamura S, Miyagi M.

Appl Opt. 1992 Oct 1;31(28):6139-44. doi: 10.1364/AO.31.006139.

PMID:
20733820
14.

Encapsulation of low-refractive-index SiO(2) nanorods by Al(2)O(3) with atomic layer deposition.

Kim SS, Gabriel NT, Song WB, Talghader JJ.

Opt Express. 2007 Nov 26;15(24):16285-91.

PMID:
19550917
15.

Optical and structural properties of LaF3 thin films.

Bischoff M, Gäbler D, Kaiser N, Chuvilin A, Kaiser U, Tünnermann A.

Appl Opt. 2008 May 1;47(13):C157-61.

PMID:
18449239
16.

Titanium oxide film for the bottom antireflective layer in deep ultraviolet lithography.

Jun BH, Han SS, Kim KS, Lee JS, Jiang ZT, Bae BS, No K, Kim DW, Kang HY, Koh YB.

Appl Opt. 1997 Mar 1;36(7):1482-6.

PMID:
18250825
17.

Automatic determination of the optical constants of inhomogeneous thin films.

Borgogno JP, Lazarides B, Pelletier E.

Appl Opt. 1982 Nov 15;21(22):4020-9. doi: 10.1364/AO.21.004020.

PMID:
20401002
18.

Optical properties of spin-on deposited low temperature titanium oxide thin films.

Rantala J, Kärkkäinen AH.

Opt Express. 2003 Jun 16;11(12):1406-10.

PMID:
19466012
19.
20.

Determination of Optical Constants of Solgel-Derived Inhomogeneous TiO(2) Thin Films by Spectroscopic Ellipsometry and Transmission Spectroscopy.

Mosaddeq-Ur-Rahman M, Yu G, Krishna KM, Soga T, Watanabe J, Jimbo T, Umeno M.

Appl Opt. 1998 Feb 1;37(4):691-7.

PMID:
18268642
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