Robust superhydrophobicity in large-area nanostructured surfaces defined by block-copolymer self assembly

Antonio Checco; Atikur Rahman; Charles T Black

doi:10.1002/adma.201304006

Robust superhydrophobicity in large-area nanostructured surfaces defined by block-copolymer self assembly

Adv Mater. 2014 Feb 12;26(6):886-91. doi: 10.1002/adma.201304006. Epub 2013 Oct 20.

Authors

Antonio Checco¹, Atikur Rahman, Charles T Black

Affiliation

¹ Condensed Matter Physics and Materials Science Department, Brookhaven National Laboratory, Upton, NY, 11973, USA.

PMID: 24142578
DOI: 10.1002/adma.201304006

Abstract

Robust, large area, superhydrophobic surfaces with feature sizes approaching 10 nm are fabricated by block-copolymer-based thin-film patterning. We show that tuning the nanostructure shape and aspect ratio dramatically influences the surface wetting properties, with proper control crucial for achieving superhydrophobicity.

Keywords: block-copolymer lithography; nanostructured surfaces; self assembly; superhydrophobicity; wetting.

Publication types

Research Support, U.S. Gov't, Non-P.H.S.