Direct lateral patterning in the formation of self-assembled monolayers (SAMs) on silicon was achieved by the photoinduced reaction of aldehydes with Si(111)-H surfaces by using the usual masking techniques (see the schematic illustration; on the right-hand side is a microscopy image of a patterned SAM formed from octadecanal).
Keywords: Monolayers; Photochemistry; Self-assembly; Silicon.
© 1998 WILEY-VCH Verlag GmbH, Weinheim, Fed. Rep. of Germany.