Nanometric thin films were prepared by dip-coating and inkjet printing ZnO nanosheets on glass plates. The side-by-side alignment of the ZnO nanosheets on the substrate resulted in thin, transparent, oriented ZnO surfaces with the high-energy {001} facets exposed. The method of nanosheet deposition affected the film morphology; the dip-coated films were very smooth and nonporous, while the inkjet-printed films were rough and porous with the estimated void volume approximately 60-70% of the total film volume. The first-order rate constants for the photocatalytic degradation of 4-chlorophenol on the nanosheet-based films were approximately 2 times larger than those on nanocolumnar ZnO films or ZnO films prepared by the sol-gel technique. We attribute the high photocatalytic activity of the ZnO nanosheets to the fact that their {001} facets were predominantly exposed to the oxidized substrate. This surface arrangement and the simplicity of fabricating the ZnO nanosheet-based films make them promising for the construction of optical devices and dye-sensitized solar cells.