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ScientificWorldJournal. 2012;2012:646417. doi: 10.1100/2012/646417. Epub 2012 Jan 4.

Free-form-fabricated commercially pure Ti and Ti6Al4V porous scaffolds support the growth of human embryonic stem cell-derived mesodermal progenitors.

Author information

  • 1Department of Biomaterials, Sahlgrenska Academy at University of Gothenburg, P.O. Box 412, 41346 Göteborg, Sweden. giuseppe.de.peppo@biomaterials.gu.se

Abstract

Commercially-pure titanium (cp-Ti) and the titanium-aluminum-vanadium alloy (Ti6Al4V) are widely used as reconstructive implants for skeletal engineering applications, due to their good mechanical properties, biocompatibility and ability to integrate with the surrounding bone. Electron beam melting technology (EBM) allows the fabrication of customized implants with tailored mechanical properties and high potential in the clinical practice. In order to augment the interaction with the biological tissue, stem cells have recently been combined with metallic scaffolds for skeletal engineering applications. We previously demonstrated that human embryonic stem cell-derived mesodermal progenitors (hES-MPs) hold a great potential to provide a homogeneous and unlimited supply of cells for bone engineering applications. This study demonstrates the effect of EBM-fabricated cp-Ti and Ti6Al4V porous scaffolds on hES-MPs behavior, in terms of cell attachment, growth and osteogenic differentiation. Displaying different chemical composition but similar surface properties, EBM-fabricated cp-Ti and Ti6Al4V scaffolds supported cell attachment and growth, and did not seem to alter the expression of genes involved in osteogenic differentiation and affect the alkaline phosphatase activity. In conclusion, interfacing hES-MPs to EBM-fabricated scaffolds may represent an interesting strategy for design of third-generation biomaterials, with the potential to promote implant integration in clinical conditions characterized by poor bone quality.

PMID:
22262956
[PubMed - indexed for MEDLINE]
PMCID:
PMC3259715
Free PMC Article

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