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Nanotechnology. 2008 Oct 1;19(39):395302. doi: 10.1088/0957-4484/19/39/395302. Epub 2008 Aug 8.

Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement.

Author information

  • 1Institute of Physics, Academia Sinica, Taipei 115, Taiwan. Department of Materials Engineering, Tatung University, Taipei 104, Taiwan.

Abstract

The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.

PMID:
21832591
[PubMed]
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