Development of a colloidal lithography method for patterning nonplanar surfaces

Langmuir. 2010 Nov 16;26(22):16662-6. doi: 10.1021/la1035147. Epub 2010 Oct 15.

Abstract

A colloidal lithography method has been developed for patterning nonplanar surfaces. Hexagonal noncontiguously packed (HNCP) colloidal particles 127 nm-2.7 μm in diameter were first formed at the air-water interface and then adsorbed onto a substrate coated with a layer of polymer adhesive ∼17 nm thick. The adhesive layer plays the critical role of securing the order of the particles against the destructive lateral capillary force generated by a thin film of water after the initial transfer of the particles from the air-water interface. The soft lithography method is robust and very simple to carry out. It is applicable to a variety of surface curvatures and for both inorganic and organic colloidal particles.

Publication types

  • Research Support, Non-U.S. Gov't
  • Research Support, U.S. Gov't, Non-P.H.S.

MeSH terms

  • Air
  • Colloids*
  • Microscopy, Electron, Scanning
  • Printing / methods*
  • Surface Properties
  • Water / chemistry

Substances

  • Colloids
  • Water