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Nanotechnology. 2010 Jul 16;21(28):285303. doi: 10.1088/0957-4484/21/28/285303. Epub 2010 Jun 18.

Direct imprinting of high resolution TiO(2) nanostructures.

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  • 1Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), Singapore 117602, Republic of Singapore.


We demonstrate a different approach to direct nanoimprint lithography of oxides, in particular TiO(2), using the metal methacrylate route which not only gives very high resolution ( approximately 20 nm) but also provides yields of approximately 100% over areas > 1 cm x 1 cm. TiO(2) was imprinted using a polymerizable liquid 'TiO(2) resin' consisting of a mixture of titanium methacrylate, ethylene glycol dimethacrylate, and azobis-(isobutyronitrile). The resin underwent free radical polymerization when imprinted using a silicon mold at 110 degrees C with pressures as low as 10 bar. Polymerization strengthens the imprinted structures, thereby giving approximately 100% yield after demolding. Heat-treatment of the imprinted structures at 400 degrees C resulted in the loss of organics and their subsequent shrinkage ( approximately 75%) without the loss of integrity or aspect ratio, and converted them to TiO(2) nanostructures as small as approximately 20 nm wide. Furthermore, our method demonstrates that large imprinted areas of sub-100-nm features can be achieved by sub-micron molds which translate into huge cost savings with the added flexibility of direct patterning of urinary as well as multi-component oxides.

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