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ACS Nano. 2010 Jun 22;4(6):3248-53. doi: 10.1021/nn100012g.

One-step photoembossing for submicrometer surface relief structures in liquid crystal semiconductors.

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  • 1Department of Physics, University of Hull, Cottingham Road, Hull, HU6 7RX, UK.


We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. A surface relief grating is spontaneously formed when a light-emitting, liquid crystalline, and semiconducting thin film is irradiated by patterned light generated using a phase mask. Grating formation requires no postannealing nor wet etching so there is potential for high-throughput fabrication. The structured film is cross-linked for robustness. Gratings deeper than the original film thickness are made with periods as small as 265 nm. Grating formation is attributed to mass transfer, enhanced by self-assembly, from dark to illuminated regions. A photovoltaic device incorporating the grating is discussed.

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