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Appl Opt. 1977 Feb 1;16(2):413-7. doi: 10.1364/AO.16.000413.

Binary phase digital reflection holograms: fabrication and potential applications.

Abstract

A novel technique for the fabrication of binary-phase computer-generated reflection holograms is described. By use of integrated circuit technology, the holographic pattern is etched into a silicon wafer and then aluminum coated to make a reflection hologram. Because these holograms reflect virtually all the incident radiation, they may find application in machining with high-power lasers. A number of possible modifications of the hologram fabrication procedure are discussed.

PMID:
20168502
[PubMed]
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