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Nanotechnology. 2010 Jan 15;21(2):025602. doi: 10.1088/0957-4484/21/2/025602. Epub 2009 Dec 3.

Phosphorus doping of ultra-small silicon nanocrystals.

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  • 1Laboratorio Nazionale MDM, Agrate Brianza (MI), Italy.


P-doped Si nanocrystals (radius <or=2 nm) were synthesized by depositing an ultrathin (0.3 nm) P- SiO(2) film close to each SiO layer of SiO/SiO(2) multilayers. During annealing P atoms migrate into the Si-rich region. Due to the low diffusivity of P in SiO(2), P atoms segregate in the Si nanocrystal region and are incorporated in the silicon nanostructures. The P level in the Si nanoclusters can be controlled by changing the P content in the P- SiO(2) layer.

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