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Opt Lett. 1994 Aug 15;19(16):1260-2.

Birefringence reduction in side-written photoinduced fiber devices by a dual-exposure method.

Abstract

An in situ birefringence measurement in conjunction with an atomic force microscope study shows that the geometric asymmetry of the side-writing process is a major cause of the induced birefringence in grating-based fiber devices. Measured refractive-index profiles of UV-exposed fibers clearly show the asymmetry in the induced index change. We demonstrate the use of a dual-exposure technique for producing low-birefringence devices.

PMID:
19855489
[PubMed]
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