Display Settings:

Format

Send to:

Choose Destination
Opt Express. 2009 Jun 22;17(13):10514-21.

45 degree polymer micromirror integration for board-level three-dimensional optical interconnects.

Author information

  • 1School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA. wangft@ece.gatech.edu

Abstract

We introduce here a simple method of integrating 45 degrees total internal reflection micro-mirrors with polymer optical waveguides by an improved tilted beam photolithography on printed circuit boards to provide surface normal light coupling between waveguides and optoelectronic devices for optical interconnects. De-ionized water is used to couple ultraviolet beam through the waveguide core polymer layer at 45 degrees angle during the photo exposure process. This technique is compatible with PCB manufacturing facility and suitable to large panel board-level manufacturing. The mirror slope is controlled accurately (within +/- 1 degrees) with high repeatability. The insertion loss of an uncoated micro-mirror is measured to be 1.6 dB.

PMID:
19550447
[PubMed]
PubMed Commons home

PubMed Commons

0 comments
How to join PubMed Commons

    Supplemental Content

    Full text links

    Icon for Optical Society of America
    Loading ...
    Write to the Help Desk