Fabrication of high-aspect ratio, micro-fluidic channels and tunnels using femtosecond laser pulses and chemical etching

Opt Express. 2004 May 17;12(10):2120-9. doi: 10.1364/opex.12.002120.

Abstract

We present novel results obtained in the fabrication of high-aspect ratio micro-fluidic microstructures chemically etched from fused silica substrates locally exposed to femtosecond laser radiation. A volume sampling method to generate three-dimensional patterns is proposed and a systematic SEM-based analysis of the microstructure is presented. The results obtained gives new insights toward a better understanding of the femtosecond laser interaction with fused silica glass (a-SiO(2)).