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Opt Lett. 2008 Dec 15;33(24):2889-91.

Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires.

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  • 1Microelectronics Sciences Laboratories, Columbia University, New York, NY 10027, USA. xl2165@columbia.edu


We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity.

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