A practical, self-catalytic, atomic layer deposition of silicon dioxide
Angew Chem Int Ed Engl
.
2008;47(33):6177-9.
doi: 10.1002/anie.200800245.
Authors
Julien Bachmann
1
,
Robert Zierold
,
Yuen Tung Chong
,
Roland Hauert
,
Chris Sturm
,
Rüdiger Schmidt-Grund
,
Bernd Rheinländer
,
Marius Grundmann
,
Ulrich Gösele
,
Kornelius Nielsch
Affiliation
1
Institute of Applied Physics, Hamburg University, Jungiusstrasse 11, 20355 Hamburg, Germany. julien.bachmann@physik.uni-hamburg.de
PMID:
18618880
DOI:
10.1002/anie.200800245
No abstract available