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Appl Opt. 1999 Mar 10;38(8):1295-301.

Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure.

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  • 1Laboratory of Laser Technologies, Institute of Automation and Electrometry, Russian Academy of Sciences, Koptuga Prospekt 1, 630090 Novosibirsk, Russia. alexp@okibox.iae.nsk.su


A precision laser pattern generator for writing arbitrary diffractive elements was developed as an alternative to Cartesian coordinate laser/electron-beam writers. This system allows for the fabrication of concentric continuous-relief and arbitrary binary patterns with minimum feature sizes of less than 0.6 microm and position accuracy of 0.1 microm over 300-mm substrates. Two resistless technologies of writing on chromium and on amorphous silicon films were developed and implemented. We investigated limit characteristics by writing special test structures. A 58-mm f/1.1 zone plate written directly is demonstrated at a lambda/50 rms wave-front error corresponding to a 0.06-microm pattern accuracy. Several examples of fabricated diffractive elements are presented.

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