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Opt Lett. 1998 Jun 1;23(11):876-8.

Multilevel diffractive microlens fabrication by one-step laser-assisted chemical etching upon high-energy-beam sensitive glass.


A new technique of laser-assisted single-step chemical etching for diffractive microlens fabrication upon high-energy-beam sensitive glass is reported. Laser direct writing with calibrated writing parameters results in gray-level mask patterns upon the ion-exchanged layer of the glass. The transmittance-dependent chemical etching upon the glass is then effectively utilized to yield suitable surface relief structures for multiple-phase-level diffractive optical elements. The one-step nonphotolithographic fabrication technique has been successfully applied for the realization of an eight-phase-level diffractive microlens.

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