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Nano Lett. 2007 Mar;7(3):745-9. Epub 2007 Feb 22.

Programmable nanolithography with plasmon nanoparticle arrays.

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  • 1FOM Institute AMOLF, Center for Nanophotonics, Kruislaan 407, NL-1098SJ Amsterdam, The Netherlands.


We describe how optical contact lithography based on plasmon particle array masks allows generation of a large number of different subwavelength exposure patterns using a single mask. Within an exact point dipole model, we study the local response of silver particles in small two-dimensional arrays with 50-200 nm spacing. We show how illumination with unfocused light allows optically addressing particles either individually or in controlled configurations; which pattern will be exposed by the mask is programmed by varying the wavelength, incidence angle, and polarization of the incident wave.

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