Regulation of spore germination in the fern Onoclea sensibilis L. was investigated by applying CO(2) alone and in combination with ethylene. Sterile spores were sown aseptically on Knops solution in loosely capped culture tubes, enclosed individually in 2-liter chambers, and grown under continuous white light. When maintained in enclosed containers with the ethylene-absorbent mercuric perchlorate and with atmospheres enriched up to 2% CO(2) (v/v), spores germinated without any inhibition. Higher levels of applied CO(2) were progressively inhibitory. Inhibition by CO(2) was reversible. When CO(2) was permitted to escape and spores were exposed subsequently to ambient laboratory air, recovery from inhibition occurred within 48 hours. Also, inhibition by CO(2) was specific, since the same degree of inhibition resulted regardless of whether spores were treated with exogenous CO(2) for 48, 72, or 96 hours. The effect on germination of 1 mul/l added ethylene depended upon the amount of applied CO(2). When containers of KOH were enclosed and ambient CO(2) was absorbed, inhibition of germination by 1 mul/l exogenous ethylene was 90%. When CO(2) was applied in concentrations from 0.25 to 1.0% (v/v), CO(2) increasingly antagonized the inhibitory action of 1 mul/l added ethylene. Thus, photoinduced germination of spores was regulated by competitively interacting levels of CO(2) and ethylene.