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Opt Lett. 2005 Sep 1;30(17):2251-3.

Trimming of microring resonators by photooxidation of a plasma-polymerized organosilane cladding material.

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  • 1Department of Material Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.


As the complexity of microphotonic devices grows, the ability to precisely trim microring resonators becomes increasingly important. Photo-oxidation trimming uses UV irradiation to oxidize a cladding layer composed of polymerized hexamethyldisilane (6M2S) deposited with plasma-enhanced chemical vapor deposition (PECVD). PECVD 6M2S has optical properties that are compatible with microring devices, and its high cross linking renders it insoluble. Photo-oxidation decreases the refractive index of PECVD 6M2S by nearly 4%, permitting large resonance shifts that are not feasible with thermal trimming techniques. Resonance shifts from single-mode, 100 microm diameter Si3N4 (n =2.2) rings were as large as 12.8 nm for the TE mode and 23.5 nm for the TM mode.

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