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J Synchrotron Radiat. 1998 May 1;5(Pt 3):702-4. Epub 1998 May 1.

Fabrication of Mo/Al multilayer films for a wavelength of 18.5 nm.

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  • 1Faculty of Engineering, Himeji Institute of Technology, 2167 Shosha, Himeji, Hyogo 671-22, Japan.


This paper reports the fabrication and evaluation of Mo/Al and Mo/Si multilayer films (MLs) for a wavelength of 18.5 nm. Calculated reflectivities of Mo/Al MLs at an incident angle of 10 degrees were about 7% higher than those of Mo/Si MLs. MLs were fabricated using an RF-magnetron sputtering deposition system. The measured reflectivity of Mo/Al MLs was 33.5%. The cause of the decreasing reflectivity was supposed to be the surface and interfacial roughness. In the surface observation utilizing atomic force microscopy, the surface roughness of Mo/Al MLs was dominated by the Al layer. Therefore, the conditions for fabricating Al films were optimized.

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