Ultramicroscopy. 1976 Dec;2(1):17-29.

High resolution shadowing for electron microscopy by sputter deposition.

Abstract

The sputtering process by an ion beam well collimated and highly accelerated provides a valuable means of high resolution shadowing, replication of a fine object by a combination of pre-shadowing and deposition as well as a preparation of supporting films. High resolution shadowing and films with grains smaller than 1 nm can be obtained by argon ion-sputtering targets of tungsten and tungsten/tantalum alloy. The resolution of carbon replicas pre-shadowed with tungsten/tantalum is determined from the radius of curvature of replicated magnesium oxide crystal corners.

PMID:: 1028206; [PubMed - indexed for MEDLINE]

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High resolution shadowing for electron microscopy by sputter deposition.

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