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Results: 5

1.
Figure 1

Figure 1. From: High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating.

Area doses and exposure windows for dense lines exposed in PMMA for 30 nm and 40 nm shrinkages in (a) 540 nm-thick PMMA and (b) 1.1 µm PMMA. The dashed lines show the doses (typically 10–20% above the clearing doses) that were used in exposures of FZPs.

Sergey Gorelick, et al. J Synchrotron Radiat. 2011 May 1;18(Pt 3):442-446.
2.
Figure 5

Figure 5. From: High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating.

Spatially resolved DE measurement. (a) The FZP is illuminated through a pinhole and the focused intensity is filtered by an OSA in the focus of the FZP. (b) The FZP and OSA are removed and the incoming intensity is measured. (c) Spatially resolved diffraction efficiency of a 500 nm-thick 100 µm-diameter FZP with an outermost zone of 50 nm at 6.2 keV photon energy.

Sergey Gorelick, et al. J Synchrotron Radiat. 2011 May 1;18(Pt 3):442-446.
3.
Figure 3

Figure 3. From: High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating.

DE measurement of FZPs having different outermost zone widths dr, heights H and diameters D. (a) The pinhole is scanned through the focus of a zone plate illuminated through an aperture having the same diameter as the zone plate. (b) Resulting profile of the measurement. (c) A reference measurement of the beam intensity is taken by removing the pinhole and the zone plate from the beam.

Sergey Gorelick, et al. J Synchrotron Radiat. 2011 May 1;18(Pt 3):442-446.
4.
Figure 4

Figure 4. From: High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating.

Diffraction efficiencies (first order) of various FZPs with an outermost zone width dr, diameter D and zone height H measured over a wide range of X-ray energies and compared with the theoretical maximum values calculated from the tabulated X-ray optical constants. The interruption in the measured efficiencies in (a) represents a change of the experimental set-up for measurements at photon energies below 6 keV (see text).

Sergey Gorelick, et al. J Synchrotron Radiat. 2011 May 1;18(Pt 3):442-446.
5.
Figure 2

Figure 2. From: High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating.

Scanning electron microscope images of Au FZPs fabricated by exposing (a, b) 540 nm- and (c, d) 1.1 µm-thick PMMA and filling the developed trenches with Au by electroplating. (a) 200 µm-diameter FZP with a 50 nm outermost zone. The inserts present the outermost regions (tilts 0° and 45°). (b) 600 µm-diameter FZP with a 50 nm outermost zone. The insert presents the outermost region. (c) 200 µm-diameter FZP with a 70 nm outermost zone. The insert presents the outermost regions (tilt 60°). (d) 30 µm-diameter FZP with a 70 nm outermost zone (tilt 55°).

Sergey Gorelick, et al. J Synchrotron Radiat. 2011 May 1;18(Pt 3):442-446.

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